top of page
3,3,3,4,4,4-Hexafluoroisobutylene
Semiconductor Etching Gas
Hexafluoroisobutylene (HFIB) is an environmentally friendly dry etching gas with low GWP, mainly used in front end etching process of semiconductor.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
Low GWP Etching Gas for Semiconductor Manufacturing
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Hexafluoroisobutylene |
Synonyms | 2-Trifluoromethyl-3,3,3-trifluoropropene; HFIB |
CAS # | 382-10-5 |
ELINCS # (EU) | 206-840-6 |
Molecular Formula | C4H2F6 |
Molecular Weight | 164.05 |
Product Properties
Chemical Name | Hexafluoroisobutylene |
Boiling Point(℃) | 14.5 |
Liquid Density（@20℃） | 1.39 |
Solubility（@20℃） | 0.23 |
bottom of page