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CF3I Etching Gas

CF3I | Semiconductor Etching Gas

Iodotrifluoromethane (CF3I) is an environmentally friendly dry etching gas with low GWP,mainly used in front end etching process of flash memory chips manufacturing.

Special Features: 
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Product Availability

Sample

Available

Commercial

Available

ISO Tank

Available

Custom Packaging

Upon Request


Product Description

Chemical Name

Iodotrifluoromethane

Synonyms

Trifluoroiodomethane

CAS #

2314-97-8

ELINCS # (EU)

219-014-5

Molecular Formula

CF3I

Structure

CF3-I

Molecular Weight

195.91

Physical State

Gas

Color

Colorless

Odor

Odorless

ODP(CFC-11 = 1)

0

GWP100(CO2 = 1)

5

Life Time (Days)

2

TWA(8-hr)

150 ppm


Product Properties

Chemical Name

Iodotrifluoromethane

Boiling Point(℃)

-22.5

Melting Point(℃)

-110

Liquid Density(@25℃)

2.096

Vapor Pressure(@20℃,MPa)

0.472

Critical Temperature(℃)

122

Critical Pressure(MPa)

4.04

Critical Volume(cm3/mole)

225

Flash Point(℃)

Not applicable

Flammability(@21℃)

Not applicable

Explosion Limit(%vol)

Not applicable


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