COF2
Semiconductor Etching Gas
COF2, or carbon tetrafluoride, is an electronic semiconductor gas that is primarily used in the plasma etching process to remove material from the wafer to create intricate patterns and designs for further processing.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
99.9% - 99.99% Purity
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Carbonic difluoride |
Synonyms | Carbonylfluoride (6CI,8CI);Carbon difluoride oxide; Carbon fluoride oxide (COF2);Carbon oxyfluoride; |
CAS # | 353-50-4 |
ELINCS # (EU) | 206-534-2 |
Molecular Formula | COF2 |
Structure | |
Molecular Weight | 66.01 |
Physical state | Gas |
Color | Colorless |
Odor | Pungent Odor |
Product Properties
Chemical Name | Carbonic difluoride |
Boiling Point(℃) | -84 |
Melting Point（℃） | -114 |
Gas Density（g/cm3） | 1139 |
Solubility | Soluble |
Flash Point（℃） | Not applicable |
Flammability（@21℃） | Not applicable |
Explosion Limit（%vol) | Not applicable |