Difluoromethane
Difluoromethane | Semiconductor Etching Gas
Difluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Difluoromethane |
Synonyms | Carbon difluoride, HFC-32, R32 |
CAS # | 75-10-5 |
ELINCS # (EU) | 200-839-4 |
Molecular Formula | CH2F2 |
Structure | CH2F2 |
Molecular Weight | 52.02 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 675 |
Atmospheric Life Time (Years) | 5 |
TWA（8-hr, mg/m³） | 2.5 |
Product Properties
Chemical Name | Difluoromethane |
Boiling Point(℃) | -52 |
Melting Point（℃） | -136 |
Liquid Density（g/cm³,） | 1.1 |
Vapor Density (Air=1) | 3.82 |
Saturated Vapor Pressure（21.1℃, kPa） | 1518.92 |
Critical Temperature（℃） | 78.45 |
Critical Pressure（MPa） | 5.83 |
Critical Density (g/cm³) | 0.43 |
Solubility in water (g/l) | >1.68 |
Flash Point（℃） | Not applicable |
Flammability | Combustible |
Explosion Limit（%vol) | 13-33 |