NF3
Nitrogen Fluoride | NF3
Nitrogen trifluoride, a colourless, odourless and stable gas at room temperature, is a strong oxidising agent. Nitrogen trifluoride is used in the microelectronics industry as an excellent plasma etching gas, cleaving to active fluorine ions during ion etching, these fluorine ions have excellent etching rates and selectivity (for silicon oxide and silicon) for silicon and tungsten compounds. A large number of applications.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity For Silicon Oxide and Silicon
Strong Oxidizing Agent
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Nitrogen Trifluoride |
Synonyms | N,N,N-Trifluoroamine; NF3;Nitrogen fluoride (NF3); nitrogenfluoride(nf3); Perfluoroammonia;Stickstoff(III)-fluorid; Stickstofftrifluorid; Trifluoroamine |
CAS # | 7783-54-2 |
ELINCS # (EU) | 232-007-1 |
Molecular Formula | NF3 |
Structure | |
Molecular Weight | 71.002 |
Physical state | Gas |
Color | Colorless |
Odor | Odorless |
Product Properties
Chemical Name | Nitrogen Trifluoride |
Boiling Point(℃) | -206.79 |
Melting Point（℃） | -129 |
Liquid Density（-129℃，101.325kPa） | |
Gas Density (Air=1) | 2.46 |
Vapor Pressure（@20℃） | 4530kPa |
Critical Temperature（℃） | -39.3 |
Critical Pressure（kPa） | 4530 |
Critical Density （kg/m3） | 522 |
Solubility（@20℃） | Insoluble |
Flash Point（℃） | Not applicable |
Flammability（@21℃） | Not applicable |
Explosion Limit（%vol) | Not applicable |