Pentafluoroethane
Plasma Etching Gas
Pentafluoroethane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Pentafluoroethane |
Synonyms | HFC 125, Khladon 125, Suva 125, Freon 125, R-125 |
CAS # | 354-33-6 |
ELINCS # (EU) | 206-557-8 |
Molecular Formula | C2HF5 |
Structure | CF3CHF2 |
Molecular Weight | 120.02 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 675 |
Life Time (Years) | 5 |
TWA（8-hr） | 2.5 |
Product Properties
Chemical Name | Pentafluoroethane |
Boiling Point(℃) | -48.5 |
Melting Point（℃） | -103 |
Liquid Density（-48.5℃, g/cm³） | 1.53 |
Vapor Density (Air=1) | 4.2 |
Saturated Vapor Pressure（@20℃, kPa） | 1414.05 |
Critical Temperature（℃） | 66.05 |
Critical Pressure（MPa） | 3.592 |
Critical Density (g/cm³) | 0.571 |
Solubility in water (25℃, mg/l) | 1071 |
Flash Point（℃） | Not applicable (non-flammable) |
Flammability (@21℃) | Not applicable (non-flammable) |
Explosion Limit（%vol) | Not applicable (non-flammable) |