Tetrafluoromethane
Tetrafluoromethane | Semiconductor Etching Gas
Trifluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Tetrafluoromethane |
Synonyms | Perfluorocarbons, tetrafluoromethane, CFC 14, Dragon 14, R-14 |
CAS # | 75-73-0 |
ELINCS # (EU) | 200-896-5 |
Molecular Formula | CF4 |
Structure | CF4 |
Molecular Weight | 88.00 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 7390 |
Atmospheric Life Time (years) | 50,000 |
TWA（8-hr, mg/m³） | 2.5 |
Product Properties
Chemical Name | Tetrafluoromethane |
Boiling Point(℃) | -127.8 |
Melting Point（℃） | -183.6 |
Liquid Density（-127.8℃, g/cm3） | 1.603 |
Vapor Density (Air=1) | 0.97 |
Saturated Vapor Pressure（15℃, MPa） | 3.65 |
Critical Temperature（℃） | -45.5 |
Critical Pressure（bar） | 37.43 |
Critical Volume（dm3/mol） | 0.412 |
Solubility in Water | Insoluble |
Flash Point（℃） | Not applicable (non-flammable) |
Flammability（@21℃） | Not applicable (non-flammable) |
Explosion Limit（%vol) | Not applicable (non-flammable) |