Trifluoromethane
Trifluoromethane | Semiconductor Etching Gas
Trifluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Trifluoromethane |
Synonyms | Fluoroform, Fluoryl, Freon 23, Arcton-1, HFC-23, R-23 |
CAS # | 75-46-7 |
ELINCS # (EU) | 200-872-4 |
Molecular Formula | CHF3 |
Structure | CHF3 |
Molecular Weight | 70.01 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 12400 |
Atmospheric Life Time (Years) | 270 |
TWA（8-hr, mg/m3） | 2.5 |
Product Properties
Chemical Name | Trifluoromethane |
Boiling Point(℃) | -82.1 |
Melting Point（℃） | -155.2 |
Liquid Density（-82.1℃, g/cm3） | 1.431 |
Vapor Density (Air=1) | 2.417 |
Saturated Vapor Pressure（@20℃, MPa） | 4.38 |
Critical Temperature（℃） | 25.7 |
Critical Pressure（MPa） | 4.816 |
Critical Density （mol/L) | 7.52 |
Solubility in Water（@20℃, g/L） | 1 |
Flash Point（℃） | Not applicable (non-flammable) |
Flammability | Not applicable (non-flammable) |
Explosion Limit（%vol) | Not applicable (non-flammable) |